MF magnetron-sputtering ion vacuum coating machine

   Uses the frequency is dozens of kilohertz intermediate frequency power sources, the equipment undergoes the strict magnetic circuit design the twin target (to target), may avoid the flame, anode vanishing, the target poison and so on phenomena, enhanced to rate, the sputtering speed, obviously raises the deposition rate, suitable to make the compound thin film (for example TiO2, TiN, TiC, TiCN, TiAlN, and so on) deposition. Intermediate frequency magnetism controlled the ion film plating machine to obtain the swift and violent development in recent years, in decoration domains and so on clock and watch, eyeglasses, hardware obtained the widespread application.
technical parameter:
 vacuum tank body: The main specification has 800*1000mm, 1000*1200mm, and may design the non-sign product according to the customer specific request.
 jig way: Uses the male rotation planet type gear structure, the work piece speed in 1-15 revolution of/minute adjustable.
control gas way: Uses the mass flowmeter control, the air admission is stable, the reaction rate is quick.
 target: Uses the whole technique of manufacture, the strict meticulous magnetic field design and the magnetic circuit layout, the sputtering sculpture is even.
 power source: The disposition has the intermediate frequency power source (specifications and so on 20KW, 40KW), the direct-current pulse power source (voltage, dutyfactor to be possible adjustment), and may act according to the actual situation addition ion source and so on ancillary facilities. 
pulls out the vacuum parameter: From the atmosphere pulls out to 5*10³Pa≤15min limit vacuum degree8*104Pa

 pumping air system: Uses the domestically produced brand mechanical pump, Luo Cibeng, to proliferate the pump, according to its vacuum chamber size determination reasonable model. May also need to provide the molecular pump or the import pump according to the customer and so on.