365nm exposure light, 1000W high-voltage mercury lamp.

Aligned by microscope with bi-oculars and bi-viewfields. The microscope has the power of maximum 375 times enlargement combined with three sets of oculars and object lens. The focus of alignment microscope can vary between 25mm and 63mm. Single or both view fields can be observed in ocular.

The main system is controlled by single-chip system, which can be operated by control panel.

Stage can move along XY orientations together with mask and wafer (when off the vacuum.). It can also vacuum-lock this kind of movements (when on the vacuum.). Wafer can move along XYZ  orientations relative to mask

Exposure area: 100mm×100mm (or 110mm×110mm)

Resolution: 1.0μm (with positive phootresist thickness of 2μm)

Alignment accuracy: ≤ ±0.8μm

Mask size: 2.5inch, 3inch, 4inch

The uniformity of the exposure: ≤ ±3.5% within f100mm

Sample size: f15-f100 mm

Sample thickness: 0.1mm-6mm (can be expanded to 15 mm)