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Ti/Cu/Pd/Zr Alloy Sputtering Target

Comp:(Ti)40-(Cu)36-Pd(14)-Zr(10)wt%

99.9%-99.999% polycrystalline Silicon sputtering Target

Our company can supply Si targets, Cr targets, ZnS targets, Hf targets, ITO targets, Ta tubes, and s

Magnesium Sputtering Target

Purity is 4N, Sputtering Targets Shape can be Discs, Rectangle, Plates, Sheets, Tube, Foils, Rods, Taper, Ring.

Magnesium Sputtering Target

Purity is 4N, Sputtering Targets Shape can be Discs, Rectangle, Plates, Sheets, Tube, Foils, Rods, Taper, Ring.

darts target

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1-7/1 to 7/7 target/CD/DVD/Blu-ray Duplicator controller

Duplicator controller Card Model: SATA788(128) Target: 1-7 Interface: SATA

High purity AlCu Slug Aluminium-Copper Alloy Metal sputtering target

High purity AlCu Target Slug Aluminium-Copper Alloy Metal sputtering target 1. High density 2. High purity

target to print

Product NO:HC20080 Color:All Color Material:HDPE Size:Custom Product Type: Flag Pole Base

target archery

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Silicon targets for film coating

Specific resistance:R<0.02ohm.cm Purity: Si>99.999% Surface apperance:Tidy Chemical Composition: Si, Packing:Vacuum packing

W1 99.97% tungsten sputtering targets for sale

tungsten sputtering targets 1.Standard: ASTM B760 2.Grade: W1,W2 3.Purity: 99.97% 4.Density: 19.3g/cm3

P-Type Silicon Sputtering Target

1.High density 2.Surly of quality assurance 3.Meet the customer needs size 4.Delivery in time 5.Most costs effective

electroplating field and vaccum coating polished titanium target

electroplating field and vaccum coating polished titanium targe 1.Resonable price 2.Manufacturer 3.Factory