工作电压范围(V)
Single-phase 208 - 240 VAC 50 / 60 Hz
Product name
Plasma-enhanced Chemical Vapor Deposition system
RF Source Power
300 W, 13.56 MHz
Vacuum Chamber material
Made of 304 stainless steel
Dimension
Dia 300 mm * 300 m H
Turbo Pump
700 L/s Pfeiffer turbo pump
Backing Pump
240 L/min (4L/s) rotary vane pump
Sample holder size
100 mm Dia. for. 4" wafer max