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High purity Gold Sputtering Target 99.999%

Shanghai Epoch Material Co., Ltd.Multispecialty supplier3 yrsCN

Key attributes

Industry-specific attributes

Application
Coating process in IC and semiconductor

Other attributes

Place of Origin
Shanghai, China
Brand Name
Epoch
Model Number
EP-suttering target341
Shape
Square /round, according to your request
Material
Gold Sputtering Target
Chemical Composition
gold
Dimensions
As request
Product name
High purity Gold Sputtering Target
Purity
99.99% 99.999%
Color
Red yellow
Density
19.32g/cm3
Melting point
1064.2℃
Vapourization temperature
2808℃ (under 10-4Torr)
Sample
available
Usage
sputtering target for coating process in IC and semiconductor
Evaporation method
Ta, Mo

Packaging and delivery

Packaging Details
Inner packing: Polyethylene film vacuum packaging
Outer packing: carton/plywood case.
Port
Shanghai, China

Supply Ability

Supply Ability
2000 Piece/Pieces per Month

Lead time

Quantity (grams)1 - 1 > 1
Lead time (days)7To be negotiated

Customization

Label
Min. order: 50

Product descriptions from the supplier

Minimum order quantity: 1 gram
$50.00 - $60.00

Variations

Total options:

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