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  • Bismuth Selenide Bi2Se3 Sputtering Target 2 Inch Diameter X 3mm Thickness
  • Bismuth Selenide Bi2Se3 Sputtering Target 2 Inch Diameter X 3mm Thickness
  • Bismuth Selenide Bi2Se3 Sputtering Target 2 Inch Diameter X 3mm Thickness
  • Bismuth Selenide Bi2Se3 Sputtering Target 2 Inch Diameter X 3mm Thickness
  • Bismuth Selenide Bi2Se3 Sputtering Target 2 Inch Diameter X 3mm Thickness
  • Bismuth Selenide Bi2Se3 Sputtering Target 2 Inch Diameter X 3mm Thickness
Bismuth Selenide Bi2Se3 Sputtering Target 2 Inch Diameter X 3mm Thickness

Bismuth Selenide Bi2Se3 Sputtering Target 2 Inch Diameter X 3mm Thickness

  • 1 - 4 Pieces
    $650.00
  • >= 5 Pieces
    $600.00

Customization:

Customized packaging(Min.Order: 10000 pieces)
Graphic customization(Min.Order: 10000 pieces)

Bismuth Selenide Bi2Se3 Sputtering Target 2 Inch Diameter X 3mm Thickness

Product overview

Core functionalities

Applicable scenarios

Unique advantages

  • Bismuth Selenide Sputtering: Designed for thin film deposition processes in semiconductor manufacturing and materials science research.
  • Precision Targeting: Ensures high-purity and uniform deposition for advanced applications.

Key features

  • 1. Advanced Material Technology

  • With Bismuth Selenide composition, you can achieve high-quality thin films essential for advanced electronic applications.

  • 2. Precision Design

  • With a 2-inch diameter and 3mm thickness, you can ensure precise material deposition, catering to specific industrial requirements.

  • 3. Enhanced Performance Parameters

  • With its specialized composition, expect consistent sputtering yields, potentially ~20% more efficient than common metal targets* [*Disclaimer: Based on internal testing; actual results may vary].

  • 4. Versatile Scenario Solutions

  • With compatibility across various semiconductor applications, you can adapt its use in both research and commercial manufacturing environments.

  • 5. Industry Certification Standards

  • With adherence to stringent production standards, you can trust in its reliability for high-stakes electronic material developments.

Product details

Bismuth Selenide Bi2Se3 Sputtering Target 2 Inch Diameter X 3mm Thickness

Our Bismuth Selenide Bi2Se3 Sputtering Target is designed for advanced material deposition applications. With a precise diameter of 2 inches and thickness of 3mm, it is ideal for creating high-quality thin films in various experimental and industrial settings.

Technical specifications

FeatureSpecificationBenefit
MaterialBismuth Selenide (Bi2Se3)Optimal for thermoelectric applications
Diameter2 inchesSuitable for standard sputtering equipment
Thickness3 mmEnsures uniform film deposition
Purity99.99%High purity for enhanced conductivity and performance

Customization guide

Adjustable parameters such as size and thickness can be customized to meet specific research or production needs.

Get inspired

With our Bismuth Selenide Sputtering Target, you can achieve precise and reliable film deposition for cutting-edge technological applications.

Choose your model

ParameterBase ModelAdvanced ModelPro Model
Purity Level99.9%99.99%99.999%*
UniformityStandardHighUltra-high
Deposition RateStandard+15%+30%*

Supplier's note

The Pro version's purity level—triple the industry standard—facilitates superior electrical performance, essential for high-precision electronic applications. When paired with its ultra-high uniformity, this creates unparalleled consistency in film thickness.

For researchers and industries requiring top-tier material performance, the Pro model offers unmatched purity and deposition rate, ensuring optimal results in demanding environments.

Frequently asked questions

  • Which model of Bismuth Selenide sputtering target is best for small-scale laboratories?

  • How should I maintain my Bismuth Selenide sputtering target for optimal performance?

  • What is the advantage of using Bismuth Selenide over other materials for sputtering processes?

  • Does the Bismuth Selenide sputtering target support customization for specific research needs?

  • Is the Bismuth Selenide material in the sputtering target FDA-approved for medical applications?

  • How does the Bismuth Selenide sputtering target compare to other metal targets in terms of efficiency?

  • Can I order a Bismuth Selenide sputtering target with custom dimensions?

  • What unique features does the Bismuth Selenide Bi2Se3 sputtering target offer for advanced material research?

Product comparison

CategoryUsage ScenariosCharacteristicsAdvantagesDisadvantages
Sputtering TargetsThin Film CoatingsHigh purity (99.99% Bi2Se3)Consistent film depositionRequires precise equipment
Other Metals & Metal ProductsSemiconductor ManufacturingChemical-resistant (Withstands 50+ chemical exposures - ASTM D543)Long-term stability in harsh environmentsHigh production cost
Thermal Management MaterialsElectronics CoolingLow thermal conductivity (0.5 W/mK)Efficient heat dissipationLimited to specific applications
Transparent ConductorsDisplay TechnologyHigh optical transparency (85% transmittance)Improved screen visibilityReduced conductivity at higher temperatures
Advanced CoatingsAerospace ComponentsCorrosion-resistant (Passed 1000-hour salt spray test)Prolongs component lifespanComplex application processes
Specialty AlloysMedical DevicesBiocompatible (ISO 10993 certified)Safe for human contactLimited manufacturing sources

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The comparison data is based on manufacturer information and industry standards. Actual results may vary depending on individual use cases. It is advisable to verify details with the supplier for the most accurate information.