Electron Beam Evaporation Coating Equipment with Auxiliary Ion Source Ion Beam Sputtering Machine with Ion Beam Gun

Technical specifications

Customization guide

Adjustable parameters for customization:

• Ion Beam Energy/Angle: Optimize coating thickness (50–150 nm) and adhesion for specific material requirements.
• Vacuum Pressure Settings: Customizable down to 1e-6 Torr for ultra-high-purity applications.
• Auxiliary Unit Configuration: Swap compressor or power modules to match process demands.

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With its hybrid electron/ion beam technology, this system enables both high-vacuum deposition and ion-assisted surface treatment. The mobile design and automated controls make it ideal for labs needing flexibility without compromising precision.

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Supplier's note

1. Technical Breakthroughs:

   • Hybrid Coating Method: Combines electron beam evaporation (for high-purity films) and ion beam sputtering (for uniform adhesion), reducing defects by 40% vs single-technology systems.
   • Advanced Vacuum System: Achieves 1e-7 Torr in Pro models—20% better than industry benchmarks—ensuring ultra-clean deposition environments.
   • Modular Design: Swappable auxiliary units cut downtime by 30% during system upgrades.

2. Version Selection Guidance:

   • Base Model: Ideal for basic labs or small-scale production requiring 50 nm coatings (e.g., R&D prototyping).
   • Advanced Model: Best for medium-volume applications needing semi-automatic control and 75 nm thickness (e.g., semiconductor testing).
   • Pro Model: Targets high-end industries like aerospace or nanotechnology, where 100 nm coatings and AI-driven precision (e.g., defect-free optical components) are critical.

*Pro Model’s 1,000 W ion beam energy triples the industry standard, enabling faster processing of heat-sensitive substrates.
**1e-7 Torr vacuum pressure meets ISO 14644-1 Class 1 cleanroom standards.