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  • Excellent Quality Made in Taiwan Stable Dow Chemical Positive Photoresist for Export
  • Excellent Quality Made in Taiwan Stable Dow Chemical Positive Photoresist for Export
  • Excellent Quality Made in Taiwan Stable Dow Chemical Positive Photoresist for Export
Excellent Quality Made in Taiwan Stable Dow Chemical Positive Photoresist for Export

Excellent Quality Made in Taiwan Stable Dow Chemical Positive Photoresist for Export

$1000.00-$12000.00/ Gallon|1 Gallon/Gallons(Min. Order)
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Excellent Quality Made in Taiwan Stable Dow Chemical Positive Photoresist for Export

Product overview

Core functionalities

Applicable scenarios

Unique advantages

  • Photolithography Patterning: A positive photoresist designed for precise surface patterning in semiconductor manufacturing, enabling microchip fabrication through light-sensitive chemical reactions.
  • Surfactant-Enhanced Performance: Incorporates surfactant properties to ensure uniform coating and improved adhesion during photolithography processes.

Key features

  • 1. Advanced Surfactant-Based Formula (Material Technology)

    • With its specialized surfactant composition, this Taiwanese-made photoresist ensures precise patterning and adhesion in semiconductor manufacturing, outperforming conventional resists in surface uniformity*.

  • 2. Optimized Light Sensitivity (Performance Parameters)

    • With enhanced light sensitivity, achieve faster exposure times compared to standard photoresists, accelerating photolithography processes by up to 15%* [*Disclaimer: Based on internal testing; actual results may vary].

  • 3. Commercial-Grade Reliability (Scenario Solutions)

    • Designed for continuous operation in high-volume semiconductor fabrication, this photoresist maintains stability and accuracy in industrial settings, surpassing lab-scale alternatives in scalability*.

  • 4. UN Certified Safety Compliance (Certification Standards)

    • Complies with UN hazardous material standards (UN 1866), ensuring safe global transportation and storage while meeting export regulations for chemical auxiliaries*.

  • 5. Customizable Process Adaptability (Scenario Solutions)

    • Customizable formulation allows tailored adjustments to light exposure and chemical resistance, adapting to diverse photolithography needs more flexibly than rigid, one-size-fits-all solutions*.

Product details

Excellent Quality Made in Taiwan Stable Dow Chemical Positive Photoresist for Export

The MICROPPOSIT S1805 O2 Positive Photoresist is a high-performance chemical auxiliary agent designed for precision photolithography applications in semiconductor and electronics manufacturing. Engineered in Taiwan to Dow Chemical standards, this surfactant-type photoresist ensures stable performance under controlled storage conditions (10°C–25°C) and meets UN 1866 hazardous material regulations.

Technical specifications

FeatureSpecificationApplication Scenario
Material TypePositive Photoresist (Surfactant)Microchip patterning, PCB fabrication
UN ClassificationUN 1866 (Hazardous Substance)Safe handling in regulated manufacturing
Storage Temperature10°C to 25°CMaintaining chemical stability
Material Code11127287Supply chain traceability

Customization guide

Adjustable parameters include viscosity (for fine-line resolution control) and light sensitivity (to optimize exposure times). For specialized needs, chemical resistance levels can be tailored to withstand harsh development processes.

Get inspired

With its precise light-reactive properties, the MICROPPOSIT S1805 O2 enables manufacturers to achieve micron-level patterning in semiconductor devices. Its stability within the specified temperature range ensures consistent performance across high-volume production lines.

Choose your model

ParameterBase ModelAdvanced ModelPro Model
Sensitivity200 nm (UV)+15% (180 nm)+30% (140 nm)*
Chemical ResistanceStandard (pH 7–9)pH 6–10pH 5–11
Resolution2 µm1.5 µm1 µm

Supplier's note

  1. Three Technical Breakthroughs:

    • Enhanced Sensitivity: The Pro Model’s 140 nm UV sensitivity allows 30% finer patterning than baseline, critical for advanced chip designs.
    • Triple Chemical Resistance: The Pro’s pH 5–11 tolerance exceeds industry standards, enabling safe use in aggressive developer solutions.
    • Temperature Stability: All models maintain performance within 10°C–25°C, ensuring reliability in fluctuating factory environments.

  2. Optimal Version Selection:

    • Base Model: Ideal for standard PCB manufacturing where cost-efficiency and moderate resolution suffice.
    • Advanced Model: Suitable for semiconductor foundries requiring pH 6–10 compatibility and 1.5 µm resolution.
    • Pro Model: Best for cutting-edge R&D and high-end chip fabrication, offering 1 µm resolution and unmatched chemical durability.

With the Pro Model’s triple chemical resistance, you can safely handle aggressive etchants while maintaining micron-level precision. Pair its low viscosity with UV lithography systems for optimal pattern definition in next-gen devices.

Frequently asked questions

  • Which positive photoresist is best suited for semiconductor photolithography applications?

  • How should I store Dow Chemical Positive Photoresist to maintain its effectiveness?

  • Positive photoresist vs. negative photoresist: Which is better for microchip manufacturing?

  • Can the Dow Chemical Positive Photoresist be customized for specific exposure requirements?

  • Is the MICROPPOSIT S1805 O2 compliant with semiconductor industry safety standards?

  • What industries use Taiwan-made Dow Chemical Positive Photoresist?

  • What safety precautions are required for handling UN 1866 classified photoresist?

  • How does the surfactant property of this photoresist improve performance?

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The comparison data is based on manufacturer information and industry standards. Actual results may vary depending on individual use cases. It is advisable to verify details with the supplier for the most accurate information.