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Ultrasonic Pyrolytic Spraying for CdS Sensitized ZnO Films for Quantum Dot-sensitized Solar Cells

Product overview

Core functionalities

Applicable scenarios

Unique advantages

  • Precision Material Cutting: Utilizes high-pressure water jets mixed with abrasive agents to cut through diverse materials like metals, glass, and composites with minimal heat damage and maximum accuracy.
  • Multi-Scenario Adaptability: Designed for both commercial/home use, offering versatility in applications ranging from industrial manufacturing to small-scale prototyping.

Key features

  • 1. Advanced Material Technology

  • With ultrasonic pyrolytic spraying technology, achieve uniform CdS-sensitized ZnO films for enhanced quantum dot-sensitized solar cell efficiency. This method ensures precise material deposition, minimizing defects and improving light absorption.

  • 2. Precision Interactive Design

  • With a touchscreen interface and multi-program presets, adjust spraying parameters (e.g., pressure, temperature) to optimize film thickness and distribution for diverse solar cell applications.

  • 3. High-Capacity Performance

  • With a 60ml capacity and rapid spraying speed, ensure efficient production of large-area films without compromising quality, ideal for lab-scale prototyping and small-batch manufacturing.

  • 4. Scenario-Specific Solutions

  • Designed for quantum dot-sensitized solar cell research, this system addresses the need for controlled CdS/ZnO film synthesis, enabling reproducible results in photovoltaic R&D and material science studies.

  • 5. Certified Quality Standards

  • Certified to ISO 9001 quality management standards, ensuring reliable performance and safety in laboratory settings. Materials comply with eco-friendly regulations for sustainable solar cell development.

Product details

Ultrasonic Pyrolytic Spraying for CdS Sensitized ZnO Films for  Quantum Dot-sensitized Solar Cells

The Ultrasonic Pyrolytic Spraying for CdS Sensitized ZnO Films is a precision tool designed for fabricating quantum dot-sensitized solar cells (QDSSCs). With a 60ml capacity and advanced ultrasonic pyrolytic technology, it ensures uniform deposition of CdS and ZnO films, enhancing photovoltaic efficiency. Ideal for research and prototyping, this device combines high precision with material versatility, enabling reproducible results in solar cell development.

Technical specifications

FeatureSpecificationApplication Scenario
Capacity60mlMedium-scale film deposition in lab settings
Spray MethodUltrasonic PyrolyticAchieve nano-scale film uniformity
Material CompatibilityCdS, ZnO, Quantum DotsFabrication of QDSSCs and thin-film solar cells
Precision ControlAdjustable droplet size (5–50μm)Custom film thickness for optimal light absorption
Energy Efficiency200W, low power consumptionSustainable operation in energy-sensitive labs

Customization guide

Adjustable parameters like spray duration, droplet size, and temperature allow customization for specific film thickness (e.g., 10–100nm) or material adhesion requirements. Ideal for tailoring films to match substrate properties in QDSSC prototypes.

Get inspired

Unlock breakthroughs in solar energy efficiency with precise CdS/ZnO film deposition. Whether optimizing light absorption in QDSSCs or testing new quantum dot materials, this tool empowers researchers to innovate at the nanoscale.

Choose your model

ParameterBase ModelAdvanced ModelPro Model
Capacity60ml80ml100ml
Spray Uniformity±5%±3%±1%*
AutomationManualSemi-automatedFully automated
Material CompatibilityCdS/ZnOCdS/ZnO + PerovskitesAll materials
Speed10ml/min15ml/min (+50%)20ml/min (+100%)

Supplier's note

  1. Technical Breakthroughs:

    • Ultrasonic Pyrolytic Spray: Reduces film defects by 40% compared to airbrush methods, ensuring uniform nanostructures.
    • 60ml Capacity: Enables consistent 50nm-thick films over 20cm² substrates, critical for scalable solar cell testing.
    • Material Flexibility: Supports both inorganic (CdS/ZnO) and emerging organic quantum dot materials.
  2. Version Selection Guide:

    • Base Model: Perfect for academic labs prioritizing cost-effectiveness while maintaining core functionality.
    • Advanced Model: Ideal for R&D teams needing higher throughput (e.g., testing 3× more samples/day) and compatibility with perovskites.
    • Pro Model: Industrial prototyping首选, offering ±1% uniformity and full automation—critical for mass-producing high-efficiency QDSSCs.

Example: With the Pro Model’s ±1% spray uniformity, you can achieve consistent film thickness across large substrates, ensuring stable photovoltaic performance. Its fully automated workflow reduces manual errors by 90%, accelerating time-to-market for solar cell innovations.

Frequently asked questions

  • Which Ultrasonic Pyrolytic Spraying model suits small-scale quantum dot solar cell research labs?

  • How do I clean the nozzle of the Ultrasonic Pyrolytic Sprayer after CdS sensitization?

  • What’s the advantage of Ultrasonic Pyrolytic Spraying over traditional methods for ZnO films?

  • Can the 60ml capacity of the sprayer be adjusted for different batch sizes?

  • Is the material used in the sprayer’s chamber resistant to CdS and ZnO solutions?

  • Does the sprayer support customization for spray patterns in quantum dot applications?

  • Is the Ultrasonic Pyrolytic Spraying method validated for enhancing quantum efficiency?

  • How does the 60ml capacity impact CdS-sensitized ZnO film thickness uniformity?

Product comparison

CategoryUsage ScenariosCharacteristicsAdvantagesDisadvantages
Ultrasonic Pyrolytic Spraying (Base)Lab-scale QDSSC fabrication60ml capacity (ISO 9001), 10 nm/min deposition rate (SEM verified), ±5% uniformity (ISO 13320)Cost-effective, low material waste, precise film thickness controlLimited capacity for large-scale production, slower than industrial CVD
Ultrasonic Pyrolytic Spraying (Advanced)Lab-to-pilot production200ml capacity▲ (ISO 9001), 20 nm/min▲ (SEM), ±3% uniformity▲ (ISO 13320)Higher throughput, scalable for pilot runs, enhanced precisionHigher cost, requires specialized maintenance
Spin CoatingThin-film uniform coating50ml max capacity (ASTM E2655), 5000 RPM (ISO 2598)Ultra-uniform coatings for small substrates, fast setupWasteful for viscous materials, limited to flat substrates, poor for thick films
Chemical Vapor Deposition (CVD)Large-scale industrial films500°C temp (ASTM E228), 1000×1000 mm substrate size (ISO 10360)High-quality, large-area deposition, ideal for conductive materialsEnergy-intensive, requires vacuum chambers, slow for prototyping
SputteringConductive coating applications99.9% purity (ASTM F67), 10Å/min deposition (ISO 15106)Excellent adhesion, high purity, suitable for metals/glassExpensive, slow deposition rate, limited to conductive substrates
Spray PyrolysisLarge-area solar cell coatings100ml/min flow (ISO 5167), 400°C operation (ASTM E228)Scalable for large substrates, low equipment costPoor thickness control (±15%), requires post-annealing, uneven surface

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