Wafer or Plananr WS2 Tungsten Sulfide Alloy Sputtering Target for Thin Film Coating

Technical specifications

Customization guide

Adjustable parameters such as thickness, diameter, and surface treatment can be tailored to meet specific coating requirements. For instance, increasing the target thickness improves durability in high-volume production scenarios.

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With its low friction coefficient and chemical stability, the WS₂ alloy enables high-performance coatings for aerospace, electronics, and optical components. Whether you need anti-wear coatings for machinery or conductive layers for semiconductors, this target delivers consistent results.

Choose your model

Supplier's note

1. Technical Breakthroughs:

   • High-Purity Alloy: The Pro Model’s 99.99% purity ensures ultra-clean coatings for semiconductor applications.
   • Enhanced Thermal Conductivity: The Pro Model’s 220 W/m·K rating outperforms industry standards by 46%, enabling faster heat dissipation during sputtering.
   • Scalable Dimensions: The 200mm diameter Pro Model supports large-area coating systems, reducing production downtime.

2. Optimal Version Selection:

   • Base Model: Ideal for small-batch R&D or standard coating tasks where cost efficiency is prioritized.
   • Advanced Model: Suitable for mid-scale production requiring improved durability and larger coating areas.
   • Pro Model: Designed for high-volume, mission-critical applications (e.g., semiconductor manufacturing) where purity and thermal performance are critical.

With the Pro Model’s 99.99% tungsten sulfide alloy, you can achieve contaminant-free coatings for next-gen electronics. Its 220 W/m·K thermal conductivity ensures stable operation in high-power sputtering systems, outperforming traditional targets by 20% or more. Pair this with its 200mm diameter, and you reduce the need for multiple targets in large-scale production.