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2696 products found for

plasma sputtering coater

made of Aluminum with high-temperature silicone O-ring • Stainless steel shield cage is included for 100% shielding of RF radiation from the chamber • Max vacuum level: 1.0E-5 Torr with optional turbo pump and chamber baking Sample Holder • Sample holder is a rotatable and heatable stage made of ceramic heater with stainless steel cover • Sample holder size: 50 mm Dia. for. Please use > 5N purity Ar gas for plasma sputtering • For the best film-substrate adhesion strength, please clean the substrate surface before coating: - Ultrasonic cleaning with the following sequential baths - (1) acetone, (2) isopropyl alcohol - to remove oil and grease. • MTI supplies single crystal substrate from A to Z • MTI RF Plasma Sputtering Coaters have successfully coated ZnO on Al2O3 substrate at 500 °C • Test the flexibility of the thin film/coated electrode with EQ-MBT-12-LD mandrel bending tester.

One fixed; one detachable for cleaning and replacement Hinged type lid with pneumatic power pole allows easy target change Sample Stage Sample holder is a rotatable and heatable stage made of ceramic heater with copper cover Sample holder size: 140 mm Dia. for. The sputtering coater can be placed on top of station High-speed turbo pump is combined with a two-stage mechanical pump (220 L/min) for max vacuum level and faster pumping speed Standard vacuum level: < 4.0E-5 Torr. Max. Aside from standard laboratory equipment, WE ALSO PROVIDE custom-made equipment such as In-Line Thin Film Coating, Special Purpose Glove Box, Lithium-ion Battery Production Line & Solar Cell Fabrication Line.

We also have set up good relations with the suppliers of relative consumables and parts for your needs. After-sales We will send the engineers to your place for installation, fine tune and for operation training. We will contact you to ask for about the conditions of the machine in periodically.

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About products and suppliers:
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